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![LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors](https://documentsales.org/78631-large_default/la-74-10-4-the-approach-to-quotclass-10quot-clean-rooms-for-the-manufacture-of-semiconductors35.jpg "LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors")
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![LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors](https://documentsales.org/78631-thickbox_default/la-74-10-4-the-approach-to-quotclass-10quot-clean-rooms-for-the-manufacture-of-semiconductors35.jpg "LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors")
LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors
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LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors
Conference Proceeding by ASHRAE, 1974
Dennis L. Merkel
Full Description
Airborne particulates in the production of small semiconductor devices can cause a poor quality product, or a device that fails completely. Another example of problems caused by particulate matter would be a very large defect in a portion of an integrated circuit chip. Air cleanliness, therefore, is a very important part in the manufaoture of miniature devices, and the use of clean rooms is highly desirable.
A "Class 10" clean room which 1s what is being approached by our most recently built room, would have a particle count which does not exceed 10 particles per cubic foot 0.5 micron and larger, and no more than 1 particle per oubic foot 1.0 micron and larger. This new classification is a proposed addition to the Federal Standard and will classify the excellent air cleanliness conditions that are now being approached.
Citation: Symposium, ASHRAE Transactions, Volume 80, Part 1, Los Angeles, CA
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